Home » Material » New Method for Preparation of Few-Layer MoS2

New Method for Preparation of Few-Layer MoS2

Posted by: Chris Na 2021-11-04 Comments Off on New Method for Preparation of Few-Layer MoS2

New Method for Preparation of Few-Layer MoS2

Details
Category: tungsten’s News
Published on Wednesday, 09 December 2020 21:02

2D materials such as few-layer MoS2 and WS2 have raise concerns due to their unique atomic thickness layered structure and photoelectric properties. As they have visible light bandgap characteristics that are not available in the earliest discovered two-dimensional material-graphene, they are important for the development of future optoelectronic devices.

The force between atomic layers of two-dimensional materials is van der Waals force that can be easily broken. Therefore, in the research of lighter optoelectronic devices, two-dimensional materials with a thinner thickness that breaks the constraints of van der Waals forces between layers are often used. The few-layer molybdenum disulfide is one of the most widely studied two-dimensional materials in the TMDCs family, and the 2H phase is the most stable form.

Few-layer MoS2 nanosheets are prepared using a simple ultrasonic exfoliation method and incorporated into polymethyl methacrylate due to the relatively weak van der Waals force between interlayers. The good nonlinear optical property of the polymethyl methacrylate composite for the nanosecond pulsed laser at both 532 and 1064 nm has been first reported. The size, thickness and atomic structure of nanosheets have been characterized by transmission electron microscopy and atomic force microscopy.

Such few-layer MoS2 nanosheets have been homogeneously incorporated into solid-state polymethyl methacrylate, which shows low optical limiting thresholds, 0.4 and 1.3 J cm−2, and low limiting differential transmittance, 2% and 3% for the nanosecond laser operating at 532 nm and 1064 nm, respectively.

The recent expanding interest in two-dimensional layered materials, molybdenum disulfide has been receiving much research attention. Few-layer MoS2 has good potential applications in nanoelectronics, optoelectronics, and flexible devices. In addition, the capability of controlling spin and valley degrees of freedom makes it a promising material for spintronic and valleytronic devices.

Recently, researchers from the Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences used lithium chloride as an intercalant to successfully establish a new method for preparing two-dimensional materials in a plasma liquid phase. This method can not only quickly peel off graphite paper, but also can be extended to prepare high-quality, low-layer 2H-phase molybdenum disulfide. The research results were published in Science China Materials.

Compared with the traditional intercalant-assisted electrochemical method, the intercalant-assisted plasma liquid phase technology has fewer product defects and does not introduce additional groups. Few-layer MoS2 can be peeled off in a controlled manner or prepare high-quality two-dimensional materials, and further promote the flexible application of two-dimensional materials in the fields of optoelectronics.

  • < Prev
  • Next >

Link to this article:New Method for Preparation of Few-Layer MoS2

Reprint Statement: If there are no special instructions, all articles on this site are original. Please indicate the source for reprinting:Tungusten,Thanks!^^